Cleanroom

The Leiden NanoLab Cleanroom (class 10,000) provides a controlled environment for the fabrication and preparation of nanoscale and microscale devices. Many materials used in experimental physics and nanotechnology are sensitive to dust and airborne contaminants. Operating under cleanroom conditions ensures the reliability, reproducibility, and high yield required for advanced research.

In this facility, users carry out key steps in the fabrication process, such as lithography, chemical development and etching. The cleanroom supports students, researchers, and external partners who work with delicate materials and require a stable and contamination-free environment.

Facilities

Lithography processes
- Electron beam lithography ▾
  Raith 100 e-beam system with resolution of <60 nm, minimum write field size is 100 um.
- Mask aligner
- Direct-write laser lithography (soon)
- Spin coater ▾
  Suitable for photo- and e-beam resists, with programmable acceleration ramps.
Etching
- Reactive ion etching ▾
  Suitable for selective dry etching of 4''-wafers with SF₆, CF₄, O₂, CHF₃ and Ar.
- Argon ion beam etching ▾
  Argon ion beam etcher for samples <20x20 mm².
- Plasma ashing
- Wet bench
Inspection
- Optical microscopy
- Profilometry

Location

The cleanroom is located on the 6th floor of the Huygens building, in the Faculty of Science.