Differences

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--- ion_beam_etcher [2020/01/21 09:12] – [Pumping down] scholma
+++ ion_beam_etcher [2025/12/02 14:12] (current) – Added new etch rate for Nb fabian
@@ Line 44: / Line 44: @@
   * Set MFC setpoint to 0 with the software.
   * Set valve override to OFF. You're now able to write a setpoint to the MFC.
-  * Slowly increase setpoint in steps of 0.5% to pump away left over Ar in the line. Open MFC fully (valve override OPEN) when pressure doesn't increase anymore.
+  * Slowly increase setpoint in steps of 5% to pump away left over Ar in the line. Open MFC fully (100%) when pressure doesn't increase anymore.
-  * Put valve override to 'OFF' and put the setpoint to 0.
+  * Put the setpoint to 0 and put valve override to 'OFF'.
   * Wait (~30 mins) until pressure is <1.0e-5.
@@ Line 91: / Line 91: @@
 ===== When done =====
-  * Let ion gun cool by increasing Ar flow (1e-2 mbar, 2 min)
+  * Let ion gun cool by increasing Ar flow such that the pressure is at 1e-2 mbar (typically MFC: 20%) for about 2 min.
   * If you cooled your sample, let the sample warm up for at least 15 min (08-04-21: Or do 5 min and do another 10 mins at 1 bar) while pumping (this to avoid possible pollution of oil or other things on your priceless sample).
   * Close green Argon valve.
@@ Line 146: / Line 146: @@
 |    Nb    | 20121114 | Stefano   |  18.8 nm  | 200 sec       |  10  | Ar, 3.2 e-4 mbar | 0.094 nm/sec |
 |    Nb    | 20140926 | Boltje    |  28.3 nm  | 420 sec       |  10  | Ar, 2.9 e-4 mbar | 0.067 nm/sec |
+|    Nb    | 20250311 | Fabian    |  60 nm    | 600 sec       |  10  | Ar, 3.0e-4 mbar  | 0.100 nm/sec |
 |    NbN   | 20050215 | Olaf      |  51.3 nm  | 352 sec       |  10  | Ar, 2.5e-4 mbar  | 0.146 nm/sec |
 |    Ni    | 20110117 | Boltje    |  15.6 nm  | 80 sec        |  10  | Ar, 3.2 e-4 mbar | 0.195 nm/sec |