The calibrations can be found on the page of each deposition system. It is crucial to include all relevant informantion about the process. A calibration should always include:

• Date of sample fabrication
• Sample ID to find sample in system logbook
• Process parameters (pressure, current, voltage, deposition time, xtal thickness etc.)
• Measurement method (X-ray, RBS, AFM etc.)
• Measurement result
• Rate (nm/s or nm/A)

• UHV sputtering system
• Z-400 sputtering system
• Oxide epitaxy system
• ATC-1800F sputtering system
• K-cell evaporator
• UHV E-gun evaporator