NanoWiki

e-beam_evaporator - [Common errors]

fabian (fabian@undisclosed.example.com) — 2025-12-03T16:12:35+00:00

Plassys MEB600SL E-beam evaporator Introduction The e-beam evaporator is a high vacuum deposition machine that heats materials with an electron beam. Due to the heat, the vapor pressure will increase until it has reached a value above the background pressure in the chamber (~1e-8 mbar), after which the vapor particles will be forced to move due to the pressure gradient arising. This creates a flux of vapor particles moving toward a substrate. The substrate on which the vapor is deposited is ro…

nanolab - [Welcome to the NanoLab!]

wigbout (wigbout@undisclosed.example.com) — 2025-11-28T14:30:27+00:00

Welcome to the NanoLab! New to the LION NanoLab NanoLab The NanoLab hosts shared facilities that are part of Leiden Institute of Physics. The NanoLab equipment for thin film deposition, lithography, etching, inspection and other processing equipment can be found on the Facilities page. If you want to use the equipment, you can find contact information on the webpage of the equipment.

ebpg_graphic_manual - [Defining the origin]

fabian (fabian@undisclosed.example.com) — 2025-11-06T23:50:19+00:00

EBPG Raith 100 Pictured Manual This is a pictured user's guide for the Raith 100 e-beam pattern generator (EBPG). The condensed version can be found here. Control Software You will use three different programmes when operating the EBPG: * e_line, which controls the actual patterning

images:cleanroom:software:eline_coordinates.png - created

fabian (fabian@undisclosed.example.com) — 2025-11-06T23:49:02+00:00

uhv_system

doorn (doorn@undisclosed.example.com) — 2025-10-29T16:07:47+00:00

Description The UHV system is a magnetron sputtering system with a background pressure around 10e-10 mbar and a deposition pressure of 1e-3 to 1e-2 mbar. It is equipped with a loadlock that holds a sample garage with 7 sample spaces. One sample space can hold a 15x15mm wafer. The substrate is transferred to and from the chamber using two linear manipulators and a wobble stick. Most targets in the chamber are at an angle with respect to the sample, and the sample can be tilted towards 3 out of 4…

spin150i_polos_spin_coater

wigbout (wigbout@undisclosed.example.com) — 2025-09-11T09:02:31+00:00

Manual: Quick reference quide:

afm_film_morphology

rog (rog@undisclosed.example.com) — 2025-07-29T10:51:46+00:00

Surface Morphology Morphology refers to the shape of an object; in thin films, the surface morphology tells us the shape of the surface. We measure morphology using nanoscale microscopy techniques like STM, AFM and TEM. There is a lot of information in the surface structure. By investigating roughness and grain size, you can optimize thin films for various applications. Material, substrate, deposition technique and parameters all influence the final surface structure. Stay mindful however: th…

morphology:agmorphology_rmsroughness_2.2nm_black_background.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:46:11+00:00

morphology:ptmorphology_rmsroughness_1.2nm_black_background.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:46:11+00:00

morphology:siox_sputtered_surface_rms_roughness_13nm_black_background.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:46:10+00:00

morphology:mogemorphology_rmsroughness_0.4nm_black_background.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:46:10+00:00

siox_sputtered_surface_rms_roughness_13nm.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:38:27+00:00

ptmorphology_rmsroughness_1.2nm.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:38:27+00:00

mogemorphology_rmsroughness_0.4nm.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:38:27+00:00

agmorphology_rmsroughness_2.2nm.png - created

rog (rog@undisclosed.example.com) — 2025-07-29T10:38:26+00:00

ebpg_raith-100

wigbout (wigbout@undisclosed.example.com) — 2025-07-29T10:30:37+00:00

Raith 100 E-beam Lithography (EBL) Introduction The Raith 100 is a direct-write machine used for maskless lithography. A 30 keV electron beam is emitted from a field-emitter, and is focused through electromagnetic lenses. Using a deflection system the beam can be moved in the xy-plane. Lithography is crucial for the

facilities - [Analysis and inspection]

wigbout (wigbout@undisclosed.example.com) — 2025-07-29T10:16:57+00:00

NanoLab facilities Sputtering * FIXME UHV (4-magnetron targets, incl. loadlock) * FIXME Z-406 (3-target diode sputtering system) * FIXME Z-407 (3-target diode sputtering system) * FIXME Off-axis (4-source, reactive sputtering for the epitaxial growth of perovskites)

wirebonder_wedge.png - created

wigbout (wigbout@undisclosed.example.com) — 2025-04-11T15:47:40+00:00

wirebonding_intermetallization.png

wigbout (wigbout@undisclosed.example.com) — 2025-04-11T09:58:16+00:00

water_monitoring.png - created

wigbout (wigbout@undisclosed.example.com) — 2025-02-11T14:45:23+00:00