ebpg_raith
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Table of Contents
Some resists can be used as both e-beam and photoresists.
Positive Resists
AR-P 672.045
- spin at 4000rpm
- bake at 180ºC for 2 min
- e-beam 20kV
- develop MIBK/IPA (1:3) 30s
- stop IPA 30s
AR-P 617.03
AR-P 642.06
AR-P 662.04
AR-P 662.06
AR-P 6200.09
Negative Resists
AR-N 7500.08
AR-N 7500.18
AR-N 7700.08
- spin at 4000rpm
- bake at 85ºC for 1 min
- e-beam 20kV at least 24ųC/cm^2
- prebake 100ºC for 2 min
- develop AR300-47 30s
- stop demiwater 30s
AR-N 7700.18
Other
Conductive Polymer PEDOT:PSS
- spin at 4000 rpm
ebpg_raith.1498731272.txt.gz · Last modified: 2017/06/29 10:14 by scholma