Differences

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--- optical_lithography [2008/07/24 14:10] – knaap
+++ optical_lithography [2019/10/08 09:41] (current) – [Spin coater] scholma
@@ Line 18: / Line 18: @@
-====== Spin coater ======
-The spin coater has 2 standard recipes. To change recipe, you need to operate on the keyboard of the spin coater (that has no labels anymore). The keyboard has 10 buttons in 2 rows.
-^ 1 | 2 |
-^ 3 | 4 |
-^ 5 | 6 |
-^ 7 | 8 |
-^ 9 |10|
-To change the recipe press the buttons in the following way:
-  - 1 edit.
-  - 10 change recipe.
-  - 7 (-) or 8 (+) to adjust.
-  - 2 end edit.
-  - use recipe 1 or 2 for optical resist.
@@ Line 69: / Line 54: @@
   - Rinse in water.
   - Dry with N<sub>2</sub> and be careful not to damage your structure.
@@ Line 77: / Line 63: @@
   - Clean the spin coater.
   - Clean up the glasses you used for the developer. It is not necessary to put developer in the waste bottle.
+  - Fill in the log book.
@@ Line 90: / Line 76: @@
 Removing resist after etching and lift-off can be done in acetone.
+====== Mask fabrication  ======
+The mask aligner uses 2.5" masks. We order 5" masks in Twente so that's 4 2.5" masks. You can design masks with the program clewin.
+Click on the link to get it: {{:clenwin.zip|}}
+====== Technical stuff =======
+Lamp type: 030W7 HBO 200W mercury vapor lamp