Differences

This shows you the differences between two versions of the page.

--- electron_beam_lithography [2008/05/29 16:27] – verstoep
+++ electron_beam_lithography [2008/06/03 10:54] (current) – verstoep
@@ Line 76: / Line 76: @@
   - Load the sample into the SEM by using the loadlock which is controlled by the red button. With this single button you can vent and pump down the loadlock. The button lights up if the loadlock is venting or pumping down. Read the [[JEOL 820 SEM#Startup|Start-Up Section of the JEOL 820 SEM Wiki]] for a step-by-step description of the load-process.
   - Slide the sample holder inside the vacuum chamber onto the stage.
 ===== System Start-Up =====
   - Turn on the display of the computer. Log in to Elphy Quantum.
-  - Set the working distance of the SEM to 10 mm. (OR: 8 for exceptional situations, 3x3 or 4x4 marker for large fields)
+  - Set the working distance of the SEM to 10 mm (8 in exceptional situations) for small structures, 3x3 for a 3x3 mm working field or 4x4 marker for a 4x4 mm working field
   - check that aperture (Diafragma) '3' is selected (At the extruding part at the top of the SEM).
   - Drive the stage to the chessy position with the ''stage control'' window. This is done so that you will not accidentally expose the resist when moving the stage later on. In general: **don't image your sample, because it will expose your resist!**.
+  - Check that PCD is on.
   - Check that the voltage is set to 20 kV and that the filament current is 0 A.
   - Turn on the main power (red square button). It will light up.
@@ Line 177: / Line 179: @@
 ====== Writing ======
 ===== Preparing your program =====
@@ Line 183: / Line 186: @@
   - Load the positionlist you want to write: file->open position list
   - Make sure your Area Dose corresponds to your process (For hardening resist, you typically require between 40 and 160 uAs/cm<sup>2</sup>). You can check this by [right-clicking] on an entry in your position list; select [properties]. Expand dialog by pressing [exposure parameters]. Press [calculator].
-  - Make sure you have selected the right layer for exposure. Check by?
+  - Make sure you have selected the right layer for exposure. This is indicated with an integer in the layer field of your list.
+  - In the positionlist your Pos1 & Pos2 should be half the size of your writing field.
 There are two ways to do the etching: with beam stabilizer OR without beam stabilizer.